Magnetics

TRM-Bar™
mQRM-Bar™
and QRM-Bar™

Download Datasheet


SRM-Bar™

Download Datasheet

SCI TRM-Bar™, SRM-Bar™, QRM-Bar™ and mQRM-BarTM magnetics give you the flexibility you need. Provided with encapsulated magnets, These sputtering magnetrons are adaptable to fit your process requirements.

SCI advanced sputtering magnetic system features include the following:

  • Multiple magnetic designs to fit your application requirements
  • Advanced magnetics designed using 3D finite element analysis software
  • Carefully matched, hi-strength magnets that are factory calibrated using an automated magnet bar measurement tool
  • Fully encapuslated magnets and robust construction for many years of trouble-free operation
  • Long-life, multi-roller system for sputter up, sputter down or off-angle sputtering
  • Magnetic uniformity adjustments that can be done easily in the field
  • A simple installation procedure with solutions for vertical installations

TRM-Bar™
mQRM-Bar™
and QRM-Bar™

Download Datasheet


SRM-Bar™

Download Datasheet

Features

 TRM-Bar™

  • Industry-proven design with thousands of bars currently in operation
  • High rate reacive mode or metal mode sputtering of optical grade films

mQRM-Bar™

  • Small magnet 4-row design increases strength by 50% over the TRM
  • No plasma-forming fringe field
  • Lower impedance than the TRM

QRM-Bar™

  • Stronger "patent pending" magnetics for low impedance sputtering of TCOs and other electrical grade films
  • Increased sputtering efficiencies reduce power consumption and operating costs

SRM-Bar™

  • High-strength magnets that are hermetically sealed
  • Advanced magnetics designed using 3D finite element analysis software
  • Magnet are matched in strength within 1%
  • Large magnet, single row design
  • Easily installed in any possible orientation
Benefits

TRM-Bar™

  • Narrow deposition profile minimizes coating losses to waste shields
  • Multiple turn-around designs for different application requirements.  The turn-arounds can be easily changed

mQRM-Bar™

  • Target materials 170mm or less that require high utilization
  • Processes that require lower impedance and are more stable over the lifetime of the target material: reactive sputtering, ITO
  • Applications for smaller sputter angles

QRM-Bar™

  • Lower impedance plasma enables higher power densities and higher achievable sputter rates for most materials
  • Increased process stability over the life-time of the target material

SRM-Bar™

  • 5-year limited warranty
  • Superior target utilization and reduced cross-corner effects
  • Industry leading magnetic uniformity up to +/- 1%
  • Narrow deposition profile minimizes coating loss to shield
  • Lengthen your campaigns by decreased downtime and increased productivity
  • Adjustable sputter angle when used with our CM-Series™ external end block

TRM-Bar™
mQRM-Bar™
and QRM-Bar™

Download Datasheet


SRM-Bar™

Download Datasheet

Utilization

TRM-Bar™ w/152mm OD Target: >70%
TRM-Bar™ w/152mm Dogboned Target: >80%
TRM-Bar™  High Utilization w/152mmOD Target - Up to 90%

mQRM-Bar™ w/170mm OD Target:>85%

QRM-Bar™ w/155mm OD: >85%
QRM-Bar™ w/165mm Target OD: >75%

SRM-Bar™ with 100mm OD target >85%

Uniformity

See SCI's Uniformity Calculator

Request a Quote Sales Support