Swing-DUO™ Software

For use with our exclusive Swing Cathode^TM, our Dynamic Uniformity Optimization (Swing-DUO^TM) software simulates and optimizes the motion profile used to control SCI magnet bar movement. It has a web-based, user-friendly, interface.

To use the software:

Members: Please follow the link Swing-DUO^TM.
Non-members: You must first register as a member and be approved.

Specifications

Inputs

Uniformity optimization allows for constant power or variable power.
Coater configurations can be quickly designed for optimal uniformity of deposition.
Uniformity drift over the life of the target can be prevented by creating multiple CAM tables for different target diameters.

Outputs

The amount of wasted material (material not deposited on the substrate) is displayed as a function of the motion profiles.
Dwell-based simulation determines the key deposition angles and calculates the time required at each angle.
CAM table output simplifies servo programming (angle and time format).
Uniformity compensation adjusts for systematic issues in the form of motion profile changes.