Sputtering Components releases recorded presentation “Sputtering with Rotary Cathodes 101.”
Sputtering Components announces an informative, recorded presentation on the Basics of Rotary Cathode Sputtering, which was released on Wednesday, August 31st, 2016. This recorded session was written and recorded by Patrick Morse, Senior Applications and Development Engineer with SCI.
This session is appropriate for those who know the basics of sputtering but want to learn more about rotary technology. If you are thinking of switching to rotaries from planar cathodes or you are relatively new to the industry, this will be a great opportunity to learn about this technology.
This session, the first in a series of four educational presentations sponsored by SCI, highlights a brief history of deposition, reviews diode sputtering, and the effect of adding a magnetic field. Future presentations will include the mechanical components of the internal and external mount end blocks, magnetics, outboard supports, gas manifolds, and anodes. Patrick will also examine the primary differences between planar and rotary cathodes, which include target material volume, target erosion grooves, sputter deposition profiles, target cooling, target changes, and return on investment.
To view this recorded presentation, go to the Sputtering Components YouTube Channel and view “Sputtering with Rotary Cathodes 101.”
If you have any questions about this material, please contact us at SCIService@sputteringcomponents.com or call us at 1-507-455-9140.
